路维光电 (688401)

Shenzhen Newway Photomask Making Co., Ltd.

KSH

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Organic Light-Emitting Diode (OLED) ConceptPrinted Circuit Board (PCB) ConceptThird-Generation SemiconductorsSSE 580 IndexSpecialized-Sophisticated-Distinctive-Innovative EnterprisesAdvanced PackagingBroker Heavy PositionsSemiconductorsContains Convertible BondsCommitment Not to Reduce HoldingsElectronicsSTAR Market 200 IndexHigh-Performing StocksChipsStable Growth IndexSSE Financial SME IndexSZSE Enterprises Composite IndexCSWD M&A IndexMid-cap Composite IndexSTAR Market Price IndexSTAR Market Composite IndexCSI All-share Information Sector IndexChina United Quality Growth IndexZhaoyang 100 IndexGuangdongSTAR Semiconductor Materials and Equipment IndexSemiconductor Materials and Equipment IndexCSI Semiconductor Index

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Company NameShenzhen Luwei Photoelectric Co., Ltd.
Listing Date2022-08-17
Issue Price25.08RMB
Registered Capital19333.37210k RMB
Legal RepresentativeDu Wubing
Registered AddressRoom 801, T5 Office Building, China Resources Financial Center, 5035 Menghai Avenue, Nanshan Street, Qianhai Shenzhen-Hong Kong Cooperation Zone, Shenzhen, Guangdong Province
IndustrySemiconductor
Main BusinessResearch and development, production, and sales of photomasks.
Company ProfileSince its establishment, Shenzhen Luwei Photoelectric Co., Ltd. has been committed to the research and development, production, and sales of photomasks. Its products are mainly used in industries such as flat panel displays, semiconductors, touch panels, and printed circuit boards, serving as the reference and blueprint for pattern transfer in downstream microelectronics manufacturing processes. After years of technological accumulation and independent innovation, the company has achieved production capabilities for G2.5 to G11 full-generation photomasks, which can support all generation production lines of flat panel display manufacturers. It has realized mass production of semiconductor photomasks at the 250nm process node and mastered the core manufacturing technologies for 180nm/150nm node semiconductor photomasks, meeting the application needs of advanced semiconductor chip packaging and devices. In products and technologies such as G11 ultra-high generation photomasks, high-precision halftone photomasks, and photoresist coating, the company has broken the long-term monopoly of foreign manufacturers. This is of significant importance for promoting the localization process of key materials in China's flat panel display and semiconductor industries and gradually achieving import substitution.

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